Nevco Engineers Pvt. Ltd.

Continuous Emission Monitoring

System 400(Opsis)

UV DOAS/FTIR Monitoring

Measurement Method : Non-contact, Non Sampling , Open path Differential Optical Absorption Spectroscopy (DOAS) suitable for measuring in the UV and IR range Gases and using optical grating (moveable) and single PMT and/or IR detector


True Monitoring

With an Opsis System 400 you will achieve true monitoring of the different components. The System 400 is not affected by contaminated sample lines, NO2 converters,condensation etc., known problems which affect the data quality from extractive monitoring systems


Why Choose System 400?

  • Cost-effective
  • High-performance monitoring of a range of gaseous compounds
  • Multiple stack with singel analyser option
  • Easily calibrated
  • Operates with a minimum of maintenance
  • EN15267, TÜV and MCERTS certified
  • One UV Analyser can Monitor Several UV Gases : NO2,SO2,O3,NO,NH3,NO3,HNO2,TRIMETHYLAMINE,ETHYLBENZENE,1,2,4-TRIMETHYLBENZENE,1,3,5-TRIMETHYLBENZENE,MONOCHLORBENZENE,DICHLORBENZENE,BENZENE,BROMOBENZENE,TOLUENE,P AND M-XYLENE,O-XYLENE,P,M AND O-CRESOL,STYRENE,FORMALDEHYDE,ACETALDEHYDE,CS2,COCL2,CH3CN ( ACETONITRIL),CLO2,PHENOL,CL2,HCN,HCL,HF,CH4
  • One IR Interroferrometer Analyser can Monitor Several IR Gases : CO,CO2,N2O,CH4,HCL,HF,ETHYLENE,H2S,PROPANE,PENTANE,CHLOROFORM,DICHLORMETHANE,ISOPROPANOL,ETHYLACETATE
  • Monitoring Stack path length : 0.5 to 30 meters or wider range
  • UV DOAS Technique
  • FTIR DOAS Technique

  • Cost-effective, Insitu Cross Stack Technology
  • High-performance monitoring of criteria pollutants, Smelling Compounds & BTX
  • Representative path-integrated data
  • No sample required
  • High-quality instruments for operation in harsh environment
  • Hundreds of systems installed worldwide
  • Serviced by highly skilled service network
  • High dynamic concentration range
  • Direct measurement of NO2
  • Operates in harsh environment
  • Operates with a minimum of maintenance
  • Low energy consumption
  • Fast and flexib
  • Non-contact measurement
  • Non-extractive
  • Low maintenance
  • Simple calibrations
  • Simple report generation
  • Comprehensive data logging
  • Logic outputs
  • On-line supervision
  • Worldwide support
  • Not affected by contaminated sample lines, NO2 converters, hydrocarbons e
  • Cost-effective, cross-stack technology
  • Representative path-integrated data
  • Easily calibrated with Multi Point Calibrators
  • Operates with a minimum of maintenance
  • Multi-gas and multi-path system with the same Analyser
  • Combines the benefits of UV/FTIR DOAS and TDL technology
  • Total monitoring solution
  • Better Area Coverage
  • Future Up gradation Possible
  • Ability to Measure both Ambient & Stack with Same Analyser
  • Better Linearity : Analyser is a High Resolution Spectrometer
  • Capable of both bench calibration and in field auditin
  • Automatically compensated /corrected to NTP ( normalized temperature and pressure) measurements
  • Facility of remote control by use of Modem , RS232 or LAN
  • Insitu Cross Stack technology Spectrometer has got a Built in data logger ( Data Storage upto 10 years), Hence External data Logger not requir
  • Power Consumption with Insitu Cross Stack technology is less as there is no pump or sampling system requir
  • Integrated signal handling system for logging values from external sensors ( upto 256 channels)
  • High Data Capture Rate of 95-98% with Insitu Cross Stack technology justifies meaning of Continuous Monitoring ( Due to Minimum maintenance)
  • Cost Of Ownership in 5 Years : Cheaper with Insitu Cross Stack technology Spectrometer due to less consumption of spares, consumables & maintenance

Compound

Max. Measurement Range(1m path)

Lowest measurement range according to EN15267

Min. detectable quantities (monitoring path 1 m, measurement time 30 sec.)

Zero drift(1 m path, max. per month)

Span drift(per month, better than)

Linearity error(measurement range, better than)

Max. length of fibre optic cable (when monitoring individual compounds)

Hardware requirement

System 400 BASIC

 

 

 

 

 

 

 

NO(4)

0–­2000 mg/m3

0–150 mg/m3

1 mg/m3

±2 mg/m3

±2%

±1%

20 m

AR600S

NO2

0–2000 mg/m3

0–20 mg/m3

0.5 mg/m3

±1 mg/m3

±2%

±1%

200 m

AR600S

SO2

0–5000 mg/m3

0–80 mg/m3

0.5 mg/m3

±1 mg/m3

±2%

±1%

100 m

AR600S

System 400 EXT

 

 

 

 

 

 

 

CO

0–10000 mg/m3

0–75 mg/m3

3 mg/m3

±6 mg/m3

±2%

±1%

10 m

AR650

H2O

0–100% Vol.

0–30% Vol.

0.1% Vol.

±0.2% Vol.

±2%

±1%

100 m

AR650

NO(4)

0–­2000 mg/m3

0–150 mg/m3

1 mg/m3

±2 mg/m3

±2%

±1%

20 m

AR600S

NO2

0–2000 mg/m3

0–20 mg/m3

0.5 mg/m3

±1 mg/m3

±2%

±1%

200 m

AR600S

SO2

0–5000 mg/m3

0–80 mg/m3

0.5 mg/m3

±1 mg/m3

±2%

±1%

100 m

AR600S

System 400 WASTE

 

 

 

 

 

 

 

CO

0–10000 mg/m3

0–75 mg/m3

3 mg/m3

±6 mg/m3

±2%

±1%

10 m

AR650

CO2*

0–100% Vol.

0–10% Vol.

0.1% Vol.

±0.2% Vol.

±2%

±1%

50 m

AR650

H2O

0–100% Vol.

0–30% Vol.

0.1% Vol.

±0.2% Vol.

±2%

±1%

100 m

AR650

HCl

0–5000 mg/m3

0–15 mg/m3

0.5 mg/m3

±1 mg/m3

±2%

±1%

100 m

AR650

HF*

0–1000 mg/m3

0–5 mg/m3

0.2 mg/m3

±0.4 mg/m3

±2%

±1%

200 m

AR650

N2O*

0–­10000 mg/m3

0–100 mg/m3

2 mg/m3

±4 mg/m3

±2%

±1%

20 m

AR650

NH3*

0–1000 mg/m3

0–10 mg/m3

0.5 mg/m3

±1 mg/m3

±2%

±1%

20 m

AR650

NO(4)

0–­2000 mg/m3

0–150 mg/m3

1 mg/m3

±2 mg/m3

±2%

±1%

20 m

AR600S

NO2

0–2000 mg/m3

0–20 mg/m3

0.5 mg/m3

±1 mg/m3

±2%

±1%

200 m

AR600S

SO2

0–5000 mg/m3

0–80 mg/m3

0.5 mg/m3

±1 mg/m3

±2%

±1%

100 m

AR600S

scroll up
scroll up